@misc{indiciae77c653d37901,
  title = {Designing topology and fractionalization in narrow gap semiconductor films via electrostatic engineering},
  author = {Tixuan Tan and Aidan P. Reddy and Liang Fu and Trithep Devakul},
  year = {2025},
  doi = {10.1103/physrevlett.133.206601},
  url = {https://arxiv.org/abs/2402.03085},
  note = {Source identifier: 2402.03085}
}