@misc{indiciaefc737a1de70b,
  title = {X-ray multibeam ptychography at up to 20 keV: nano-lithography enhances X-ray nano-imaging},
  author = {Tang Li and Maik Kahnt and Thomas L. Sheppard and Runqing Yang and Ken Vidar Falch and Roman Zvagelsky and Pablo Villanueva-Perez and Martin Wegener and Mikhail Lyubomirskiy},
  year = {2024},
  url = {https://arxiv.org/abs/2402.12082},
  note = {Source identifier: 2402.12082}
}