@misc{indiciaec181d08559d7,
  title = {Optimizing Josephson Junction Reproducibility in 30 kV E-beam Lithography: Analysis of Backscattered Electron Distribution},
  author = {A. M. Rebello and L. M. Ruela and G. Moreto and N. Y. Klein and E. Martins and I. S. Oliveira and F. Rouxinol and J. P. Sinnecker},
  year = {2024},
  url = {https://arxiv.org/abs/2403.19614},
  note = {Source identifier: 2403.19614}
}