TY  - RPRT
TI  - Using a coupled optical and electrical monitoring method to follow the R-HiPIMS TiO$_2$ deposition process drifts
AU  - D Boivin
AU  - R Jean-Marie-Désirée
AU  - A Najah
AU  - S Cuynet
AU  - L de Poucques
PY  - 2024
DO  - 10.1088/1402-4896/ad3302
UR  - https://arxiv.org/abs/2404.06084
ID  - 2404.06084
ER  -