TY  - RPRT
TI  - Overlapping Top Gate Electrodes based on Low Temperature Atomic Layer Deposition for Nanoscale Ambipolar Lateral Junctions
AU  - Christopher Fuchs
AU  - Lena Fürst
AU  - Hartmut Buhmann
AU  - Johannes Kleinlein
AU  - Laurens W. Molenkamp
PY  - 2024
UR  - https://arxiv.org/abs/2404.06914
ID  - 2404.06914
ER  -