@misc{indiciae7b2da7028fcf,
  title = {Atomic layer etching of SiO\$\_2\$ using sequential exposures of Al(CH\$\_3\$)\$\_3\$ and H\$\_2\$/SF\$\_6\$ plasma},
  author = {David Catherall and Azmain Hossain and Austin Minnich},
  year = {2024},
  doi = {10.1116/6.0003793},
  url = {https://arxiv.org/abs/2405.05491},
  note = {Source identifier: 2405.05491}
}