TY  - RPRT
TI  - A Comparison of Electronic, Dielectric, and Thermoelectric Properties of Monolayer of HfX2N4(X = Si, Ge) through First-Principles Calculations
AU  - Chayan Das
AU  - Abhishek
AU  - Dibyajyoti Saikia
AU  - Appala Naidu Gandi
AU  - Satyajit Sahu
PY  - 2024
UR  - https://arxiv.org/abs/2405.09498
ID  - 2405.09498
ER  -