@misc{indiciae9c1b362c53ec,
  title = {Cryogenic Behavior of High-Permittivity Gate Dielectrics: The Impact of the Atomic Layer Deposition Temperature and the Lithographic Patterning Method},
  author = {Alessandro Paghi and Sebastiano Battisti and Simone Tortorella and Giorgio De Simoni and Francesco Giazotto},
  year = {2025},
  doi = {10.1063/5.0250428},
  url = {https://arxiv.org/abs/2407.04501},
  note = {Source identifier: 2407.04501}
}