@misc{indiciaec1becb3af705,
  title = {Defect engineering-induced Seebeck coefficient and carrier concentration decoupling in CuI by noble gas ion implantation},
  author = {Martin Markwitz and Peter P. Murmu and Takao Mori and John V. Kennedy and Ben J. Ruck},
  year = {2024},
  doi = {10.1063/5.0233754},
  url = {https://arxiv.org/abs/2411.01015},
  note = {Source identifier: 2411.01015}
}