TY  - RPRT
TI  - Defect engineering-induced Seebeck coefficient and carrier concentration decoupling in CuI by noble gas ion implantation
AU  - Martin Markwitz
AU  - Peter P. Murmu
AU  - Takao Mori
AU  - John V. Kennedy
AU  - Ben J. Ruck
PY  - 2024
DO  - 10.1063/5.0233754
UR  - https://arxiv.org/abs/2411.01015
ID  - 2411.01015
ER  -