TY  - RPRT
TI  - Atomistic modeling of diffusion processes at Al(Si)/Si(111) interphase boundaries obtained by vapor deposition
AU  - Yang Li
AU  - Raj K. Koju
AU  - Yuri Mishin
PY  - 2024
DO  - 10.1016/j.actamat.2025.120937
UR  - https://arxiv.org/abs/2411.01672
ID  - 2411.01672
ER  -