@misc{indiciae931ebde1c0ff,
  title = {Reproducible Monolayer MoS2 Devices Free of Resist Contamination by Gold Mask Lithography},
  author = {Yumeng Liu and Yizhuo Wang and Zhengfang Fan and Jianyong Wei and Shuwen Guo and Zhijuan Su and Yaping Dan},
  year = {2024},
  url = {https://arxiv.org/abs/2411.02205},
  note = {Source identifier: 2411.02205}
}