@misc{indiciaeda30526a0659,
  title = {Effect of Top Al\$\_2\$O\$\_3\$ Interlayer Thickness on Memory Window and Reliability of FeFETs With TiN/Al\$\_2\$O\$\_3\$/Hf\$\_\{0.5\}\$Zr\$\_\{0.5\}\$O\$\_2\$/SiO\$\_x\$/Si (MIFIS) Gate Structure},
  author = {Tao Hu and Xinpei Jia and Runhao Han and Jia Yang and Mingkai Bai and Saifei Dai and Zeqi Chen and Yajing Ding and Shuai Yang and Kai Han and Yanrong Wang and Jing Zhang and Yuanyuan Zhao and Xiaoyu Ke and Xiaoqing Sun and Junshuai Chai and Hao Xu and Xiaolei Wang and Wenwu Wang and Tianchun Ye},
  year = {2024},
  url = {https://arxiv.org/abs/2411.08558},
  note = {Source identifier: 2411.08558}
}