@misc{indiciae09a642996dbf,
  title = {Dissociative photoionization of EUV lithography photoresist models},
  author = {Marziogiuseppe Gentile and Marius Gerlach and Robert Richter and Michiel J. van Setten and John S. Petersen and Paul van der Heide and Fabian Holzmeier},
  year = {2024},
  doi = {10.1117/12.2657702},
  url = {https://arxiv.org/abs/2411.10177},
  note = {Source identifier: 2411.10177}
}