@misc{indiciae2240253d78da,
  title = {Atomic layer etching of SiO\$\_2\$ using sequential SF\$\_6\$ gas and Ar plasma},
  author = {Jun Peng and Rakshith Venugopal and Robert Blick and Robert Zierold},
  year = {2024},
  url = {https://arxiv.org/abs/2412.20653},
  note = {Source identifier: 2412.20653}
}