TY  - RPRT
TI  - Atomic layer etching of SiO$_2$ using sequential SF$_6$ gas and Ar plasma
AU  - Jun Peng
AU  - Rakshith Venugopal
AU  - Robert Blick
AU  - Robert Zierold
PY  - 2024
UR  - https://arxiv.org/abs/2412.20653
ID  - 2412.20653
ER  -