TY  - RPRT
TI  - Stacking-dependent Electronic and Topological Properties in van der Waals Antiferromagnet MnBi$_2$Te$_4$ Films
AU  - Jiaheng Li
AU  - Quansheng Wu
AU  - Hongming Weng
PY  - 2025
DO  - 10.1038/s41524-025-01545-1
UR  - https://arxiv.org/abs/2501.02734
ID  - 2501.02734
ER  -