@misc{indiciae4c519614f107,
  title = {A reduced-temperature process for preparing atomically clean Si(100) and SiGe(100) surfaces with vapor HF},
  author = {Luis Fabián Peña and Evan M. Anderson and John P. Mudrick and Samantha G. Rosenberg and David A. Scrymgeour and Ezra Bussmann and Shashank Misra},
  year = {2025},
  doi = {10.1021/acs.jpcc.5c00280},
  url = {https://arxiv.org/abs/2501.05620},
  note = {Source identifier: 2501.05620}
}