TY  - RPRT
TI  - A reduced-temperature process for preparing atomically clean Si(100) and SiGe(100) surfaces with vapor HF
AU  - Luis Fabián Peña
AU  - Evan M. Anderson
AU  - John P. Mudrick
AU  - Samantha G. Rosenberg
AU  - David A. Scrymgeour
AU  - Ezra Bussmann
AU  - Shashank Misra
PY  - 2025
DO  - 10.1021/acs.jpcc.5c00280
UR  - https://arxiv.org/abs/2501.05620
ID  - 2501.05620
ER  -