@misc{indiciae810f0e51cb12,
  title = {Benchmarking analytical electron ptychography methods for the low-dose imaging of beam-sensitive materials},
  author = {Hoelen L. Lalandec Robert and Max Leo Leidl and Knut Müller-Caspary and Jo Verbeeck},
  year = {2025},
  url = {https://arxiv.org/abs/2501.08874},
  note = {Source identifier: 2501.08874}
}