@misc{indiciaec42b6dc29139,
  title = {Mechanism of Oxygen Reduction via Chemical Affinity in NiO/SiO2 Interfaces Irradiated with keV Energy Hydrogen and Helium Ions for Heterostructure Fabrication},
  author = {Mario Mery and Claudio Gonzalez-Fuentes and Igor Stankovic and Jorge M. Nuñez and Jorge E. Valdés and Myriam H Aguirre and Carlos García},
  year = {2025},
  doi = {10.1039/d4nh00460d},
  url = {https://arxiv.org/abs/2501.17101},
  note = {Source identifier: 2501.17101}
}