@misc{indiciae68d26716e619,
  title = {Eliminating nanometer-scale asperities on metallic thin films through plasma modification processes studied by molecular dynamics and AFM},
  author = {Tomoyuki Tsuyama and Tatsuki Oyama and Yu Azuma and Haruhisa Ohashi and Masahiro Irie and Ayumi Yamakawa and Shoko Uetake and Takayuki Konno and Takahiro Ukai and Kohei Ochiai and Nobuyuki Iwaoka and Atsushi Hashimoto and Yoshishige Okuno},
  year = {2025},
  url = {https://arxiv.org/abs/2502.09031},
  note = {Source identifier: 2502.09031}
}