@misc{indiciae27863fae1f36,
  title = {Atomic layer etching of niobium nitride using sequential exposures of O\$\_2\$ and H\$\_2\$/SF\$\_6\$ plasmas},
  author = {Azmain A. Hossain and Sela Murphy and David S. Catherall and Anthony J. Ardizzi and Austin J. Minnich},
  year = {2025},
  doi = {10.1116/6.0004548},
  url = {https://arxiv.org/abs/2502.17745},
  note = {Source identifier: 2502.17745}
}