TY  - RPRT
TI  - Atomic layer etching of niobium nitride using sequential exposures of O$_2$ and H$_2$/SF$_6$ plasmas
AU  - Azmain A. Hossain
AU  - Sela Murphy
AU  - David S. Catherall
AU  - Anthony J. Ardizzi
AU  - Austin J. Minnich
PY  - 2025
DO  - 10.1116/6.0004548
UR  - https://arxiv.org/abs/2502.17745
ID  - 2502.17745
ER  -