@misc{indiciae3f5ea40e58b7,
  title = {Wafer scale reactive sputtering of highly oriented and ferroelectric Al\$\_\{0.6\}\$Sc\$\_\{0.4\}\$N from 300 mm AlSc Targets},
  author = {Tom-Niklas Kreutzer and Muhammad Zubair Ghori and Md Redwanul Islam and Fabian Lofink and Fabian Stoppel and Axel Müller-Groeling and Simon Fichtner},
  year = {2025},
  doi = {10.1088/1361-6439/adeb95},
  url = {https://arxiv.org/abs/2503.17170},
  note = {Source identifier: 2503.17170}
}