TY  - RPRT
TI  - Wafer scale reactive sputtering of highly oriented and ferroelectric Al$_{0.6}$Sc$_{0.4}$N from 300 mm AlSc Targets
AU  - Tom-Niklas Kreutzer
AU  - Muhammad Zubair Ghori
AU  - Md Redwanul Islam
AU  - Fabian Lofink
AU  - Fabian Stoppel
AU  - Axel Müller-Groeling
AU  - Simon Fichtner
PY  - 2025
DO  - 10.1088/1361-6439/adeb95
UR  - https://arxiv.org/abs/2503.17170
ID  - 2503.17170
ER  -