@misc{indiciae07619fb8e9ac,
  title = {Curvilinear Mask Optimization for Inverse Lithography Based on B-splines and Delaunay Triangulation},
  author = {Xiaoru Yi and Junqing Chen},
  year = {2025},
  url = {https://arxiv.org/abs/2504.11962},
  note = {Source identifier: 2504.11962}
}