TY  - RPRT
TI  - Curvilinear Mask Optimization for Inverse Lithography Based on B-splines and Delaunay Triangulation
AU  - Xiaoru Yi
AU  - Junqing Chen
PY  - 2025
UR  - https://arxiv.org/abs/2504.11962
ID  - 2504.11962
ER  -