@misc{indiciaeb43898a28b37,
  title = {In-situ and Non-contact Etch Depth Prediction in Plasma Etching via Machine Learning (ANN \& BNN) and Digital Image Colorimetry},
  author = {Minji Kang and Seongho Kim and Eunseo Go and Donghyeon Paek and Geon Lim and Muyoung Kim and Soyeun Kim and Sung Kyu Jang and Min Sup Choi and Woo Seok Kang and Jaehyun Kim and Jaekwang Kim and Hyeong-U Kim},
  year = {2025},
  url = {https://arxiv.org/abs/2505.03826},
  note = {Source identifier: 2505.03826}
}