@misc{indiciaef465593e179b,
  title = {Fundamental Understanding of Exposure and Process Chemistry for Enhanced Lithography and Stability of Metal Oxide Resists},
  author = {Kevin M. Dorney and Ivan Pollentier and Fabian Holzmeier and Roberto Fallica and Ying-Lin Chen and Lorenzo Piatti and Dhirendra Singh and Laura Galleni and Michiel J. van Setten and Hyo Seon Suh and Danilo De Simone and Geoffrey Pourtois and Paul van der Heide and John Petersen},
  year = {2025},
  doi = {10.1117/12.3051260},
  url = {https://arxiv.org/abs/2505.07639},
  note = {Source identifier: 2505.07639}
}