@misc{indiciae3aeb4e6916e0,
  title = {Design of an all-facet illuminator for high NA EUV lithography exposure tool based on deep reinforcement learning},
  author = {Tong Li and Yuqing Chen and Yanqiu Li and Lihui Liu},
  year = {2025},
  url = {https://arxiv.org/abs/2506.15558},
  note = {Source identifier: 2506.15558}
}