TY  - RPRT
TI  - Design of an all-facet illuminator for high NA EUV lithography exposure tool based on deep reinforcement learning
AU  - Tong Li
AU  - Yuqing Chen
AU  - Yanqiu Li
AU  - Lihui Liu
PY  - 2025
UR  - https://arxiv.org/abs/2506.15558
ID  - 2506.15558
ER  -