@misc{indiciaeee95902e838e,
  title = {Atomic layer etching of InGaAs using sequential exposures of atomic hydrogen and oxygen gas},
  author = {Mete M. Bayrak and Anthony J. Ardizzi and Sadhvikas Addamane and Kieran Cleary and Austin J. Minnich},
  year = {2025},
  url = {https://arxiv.org/abs/2506.19749},
  note = {Source identifier: 2506.19749}
}