TY  - RPRT
TI  - Atomic layer etching of InGaAs using sequential exposures of atomic hydrogen and oxygen gas
AU  - Mete M. Bayrak
AU  - Anthony J. Ardizzi
AU  - Sadhvikas Addamane
AU  - Kieran Cleary
AU  - Austin J. Minnich
PY  - 2025
UR  - https://arxiv.org/abs/2506.19749
ID  - 2506.19749
ER  -