@misc{indiciae13e996480f66,
  title = {Etching-to-deposition transition in SiO\$\_2\$/Si\$\_3\$N\$\_4\$ using CH\$\_x\$F\$\_y\$ ion-based plasma etching: An atomistic study with neural network potentials},
  author = {Hyungmin An and Sangmin Oh and Dongheon Lee and Jae-hyeon Ko and Dongyean Oh and Changho Hong and Seungwu Han},
  year = {2025},
  url = {https://arxiv.org/abs/2508.00327},
  note = {Source identifier: 2508.00327}
}