TY  - RPRT
TI  - Etching-to-deposition transition in SiO$_2$/Si$_3$N$_4$ using CH$_x$F$_y$ ion-based plasma etching: An atomistic study with neural network potentials
AU  - Hyungmin An
AU  - Sangmin Oh
AU  - Dongheon Lee
AU  - Jae-hyeon Ko
AU  - Dongyean Oh
AU  - Changho Hong
AU  - Seungwu Han
PY  - 2025
UR  - https://arxiv.org/abs/2508.00327
ID  - 2508.00327
ER  -