@misc{indiciae2e7c46e0ccde,
  title = {Enhanced Performance of FeFET Gate Stack via Heterogeneously co-doped Ferroelectric HfO\$\_2\$ Films},
  author = {Shouzhuo Yang and David Lehninger and Peter Reinig and Fred Schöne and Raik Hoffmann and Konrad Seidel and Maximilian Lederer and Gerald Gerlach},
  year = {2025},
  url = {https://arxiv.org/abs/2508.16768},
  note = {Source identifier: 2508.16768}
}