@misc{indiciae1eae1782dd86,
  title = {Multi-diagnostic characterization of inductively coupled discharges with tailored waveform substrate bias for precise control of plasma etching},
  author = {Jonas Giesekus and Anton Pletzer and Florian Beckfeld and Katharina Noesges and Claudia Bock and Julian Schulze},
  year = {2025},
  url = {https://arxiv.org/abs/2509.01171},
  note = {Source identifier: 2509.01171}
}