TY  - RPRT
TI  - Multi-diagnostic characterization of inductively coupled discharges with tailored waveform substrate bias for precise control of plasma etching
AU  - Jonas Giesekus
AU  - Anton Pletzer
AU  - Florian Beckfeld
AU  - Katharina Noesges
AU  - Claudia Bock
AU  - Julian Schulze
PY  - 2025
UR  - https://arxiv.org/abs/2509.01171
ID  - 2509.01171
ER  -