@misc{indiciae3b5a780a7886,
  title = {Room temperature reactive sputtering deposition of titanium nitride with high sheet kinetic inductance},
  author = {Juliang Li and Peter S. Barry and Tom Cecil and Marharyta Lisovenko and Volodymyr Yefremenko and Gensheng Wang and Serhii Kruhlov and Goran Karapetrov and Clarence Chang},
  year = {2025},
  url = {https://arxiv.org/abs/2509.14133},
  note = {Source identifier: 2509.14133}
}