@misc{indiciae6b5c3dab0ff5,
  title = {Identification of formation of amorphous Si phase in SiOxNy films produced by plasma enhanced chemical vapor deposition},
  author = {M. V. Voitovych and A. Sarikov and V. O. Yukhymchuk and V. V. Voitovych and M. O. Semenenko},
  year = {2025},
  doi = {10.1016/j.optmat.2026.117895},
  url = {https://arxiv.org/abs/2510.14701},
  note = {Source identifier: 2510.14701}
}