TY  - RPRT
TI  - Identification of formation of amorphous Si phase in SiOxNy films produced by plasma enhanced chemical vapor deposition
AU  - M. V. Voitovych
AU  - A. Sarikov
AU  - V. O. Yukhymchuk
AU  - V. V. Voitovych
AU  - M. O. Semenenko
PY  - 2025
DO  - 10.1016/j.optmat.2026.117895
UR  - https://arxiv.org/abs/2510.14701
ID  - 2510.14701
ER  -