@misc{indiciae8e18a1b1057a,
  title = {Gate Dielectric Engineering with an Ultrathin Silicon-oxide Interfacial Dipole Layer for Low-Leakage Oxide-Semiconductor Memories},
  author = {Fabia F. Athena and Jonathan Hartanto and Matthias Passlack and Jack C. Evans and Jimmy Qin and Didem Dede and Koustav Jana and Shuhan Liu and Tara Peña and Eric Pop and Greg Pitner and Iuliana P. Radu and Paul C. McIntyre and H. -S. Philip Wong},
  year = {2025},
  url = {https://arxiv.org/abs/2511.00786},
  note = {Source identifier: 2511.00786}
}