@misc{indiciaec26cfe3ac044,
  title = {Uncertainty quantification and parameter optimization of plasma etching process using heteroscedastic Gaussian process},
  author = {Yongsu Jung and Minji Kang and Muyoung Kim and Min Sup Choi and Hyeong-U Kim and Jaekwang Kim},
  year = {2025},
  url = {https://arxiv.org/abs/2511.04990},
  note = {Source identifier: 2511.04990}
}