@misc{indiciae7e9b01985ab8,
  title = {Chemical vapor deposition growth of continuous monolayer antiferromagnetic CrOCl films},
  author = {Chao Chen and Yulu Liu and Hongyan Lu and Zihao Wang and Bowen Zheng and Qian Guo and Jingkuan Xiao and Ping Wang and Wanting Xu and Yulin Han and Mingxuan Chen and Xiaofan Cai and Jiabei Huang and Yaqing Han and Di Zhang and Renjun Du and Alexander S. Mayorov and Ziying Li and Shuai Zhang and Yi Huang and Tingting Cheng and Zhaolong Chen and Ronghua Liu and Nujiang Tang and Haibo Ni and Di Wu and Libo Gao and Xiaoxiang Xi and Qianghua Wang and Lei Wang and Kostya S. Novoselov and Geliang Yu},
  year = {2025},
  doi = {10.1038/s41467-025-66142-8},
  url = {https://arxiv.org/abs/2511.14189},
  note = {Source identifier: 2511.14189}
}