TY  - RPRT
TI  - Topology-Directed Silicide Formation: An Explanation for the Growth of C49-TiSi$_2$ on the Si(100) Surface
AU  - Lukas Hückmann
AU  - Jonathon Cottom
AU  - Jörg Meyer
AU  - Emilia Olsson
PY  - 2026
DO  - 10.1039/d6na00467a
UR  - https://arxiv.org/abs/2601.10368
ID  - 2601.10368
ER  -