TY  - RPRT
TI  - Atomic-Scale Mechanisms of SiO$_2$ Plasma-Enhanced Chemical Vapor Deposition Revealed by Molecular Dynamics with a Machine-Learning Interatomic Potential
AU  - Jaehoon Kim
AU  - Minseok Moon
AU  - Hyunsung Cho
AU  - Hyeon-Deuk Kim
AU  - Rokyeon Kim
AU  - Gyehyun Park
AU  - Seungwu Han
AU  - Youngho Kang
PY  - 2026
UR  - https://arxiv.org/abs/2603.11416
ID  - 2603.11416
ER  -