TY  - RPRT
TI  - Fully Atomic-Layer-Deposited Vertical Complementary FeRAM with Ultra-High 2Pr > 100 uC/cm2 and High Endurance > 1E10 cycles
AU  - Renhao Xue
AU  - Ruizhan Yan
AU  - Mansun Chan
AU  - Xiwen Liu
PY  - 2026
UR  - https://arxiv.org/abs/2604.15131
ID  - 2604.15131
ER  -