TY  - RPRT
TI  - The influence of implantation conditions on dopant activation in Al-implanted 4H-SiC: A MD study applying an Al potential fitted to DFT barriers
AU  - Sabine Leroch
AU  - Robert Stella
AU  - Andreas Hössinger
AU  - Lado Filipovic
PY  - 2026
DO  - 10.1039/d6tc01299j
UR  - https://arxiv.org/abs/2604.22434
ID  - 2604.22434
ER  -