@misc{indiciae55f50eec9b09,
  title = {Silicon-compatible ideal antiferroelectricity with large digital electromechanical responses enabled by thermal-strain domain engineering},
  author = {Hao Xiong and Huazhang Zhang and Liang Shu and Yangyang Si and Jiaqi Liu and Chao Zhou and Rui Zhang and Jingxuan Li and Jinyang Li and Chhavi Rastogi and Hao Pan and Bin Xu and Er-Jia Guo and Yunlong Tang and Sujit Das and Philippe Ghosez and Qian Li and Jing-Feng Li and Zuhuang Chen},
  year = {2026},
  doi = {10.1093/nsr/nwag521},
  url = {https://arxiv.org/abs/2606.29219},
  note = {Source identifier: 2606.29219}
}